CVD/PECVD Tube Furnace
- Max Temp:1200 °C
- Atmosphere Control:Vacuum, N₂, Ar, H₂, mixed gas and other inert / reducing atmospheres
- Thermocouple:K-type (1200) / S-type (1400) / B-type (1600)
- Heating rate:≤ 20 °C / min
- Certification:CE / ISO 9001 certified
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Customized Vacuum Solutions
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High Thermal Efficiency
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Ultra-Clean Vacuum Environment
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Stable & Repeatable Results
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Industry-Grade Safety Design
Product Description
The Brother CVD/PECVD system is a precision thin-film deposition platform built on plasma-enhanced chemical vapor deposition (PECVD) technology. It enables high-quality film growth on a broad range of substrates — metals, semiconductors, and insulators alike — making it well suited for research and pilot-scale production in microelectronics, optoelectronics, flat-panel display, and energy storage applications.
Product Highlights
Precise, Repeatable Temperature Control
Operates up to 1200℃ using imported Fe-Cr-Al-Mo resistance wire heating elements
50-segment programmable temperature profiles with PID auto-tuning for consistent ramp and soak cycles
Ramp rate up to 20℃/min
Temperature accuracy held to ±1℃, supporting demanding, repeatable process windows
Built-In Safety Systems
Automatic power cutoff on over-temperature to prevent runaway conditions
Automatic shutdown on furnace body leakage current for operator protection
Dual-layer air-cooled shell keeps external surface temperature below 50℃ during operation
Superior Insulation and Sealing
Furnace chamber liner uses Japanese-process, vacuum-formed high-purity polycrystalline alumina fiber for excellent thermal insulation and lower energy consumption
304 stainless steel KF quick-release flanges for fast, reliable sealing and easy maintenance access
High-Throughput, High-Uniformity Deposition
RF glow-discharge (plasma) technology significantly increases film growth rate, reaching up to 10 Å/s
Multi-point RF feed design combined with optimized gas distribution and thermal uniformity engineering delivers film uniformity within 8% across large areas
Semiconductor-grade design principles keep run-to-run substrate deviation below 2% for excellent batch consistency
Robust system architecture ensures stable, repeatable process performance over extended runs
Technical Specifications(Customization available)
Product Name | CVD Chemical Vapor Deposition System |
Model | BR-CVD/PECVD |
Slide | With slide, the furnace can be slid to achieve rapid heating or cooling function |
Heating Zone Length | 400mm single heating zone/dual heating zone |
Furnace Tube Size | 60x1200mm (outer diameter x length) |
Furnace Tube Material | High purity quartz tube |
Operating Temperature | ≤1100℃ |
Temperature Control System | Artificial intelligence PID instrument, automatic temperature control |
Temperature Control Accuracy | ±1℃ (with over-temperature and thermocouple-off alarm functions) |
Heating Rate | Recommended 0~10℃/min |
Heating Element | High quality resistance wire |
Vacuum System | |
Rated Voltage | Single phase 220V 50Hz |
Gas Filling System | Inert gases such as nitrogen and argon |
Temperature Measuring | Thermocouple temperature measurement |
Shell Structure | Double-layer shell structure with air cooling system |
Vacuum Flange | It has an air inlet and a pressure control valve, pneumatic pressure relief valve and air release valve at the other end. |
Air Supply System | Four-way precision proton flow meter, adjust gas flow through touch screen |
Vacuum System | Rotary vane pump, the vacuum degree can reach 1Pa in the cold state of the empty furnace. |
Vacuum gauge: Imported digital display vacuum gauge displays the vacuum degree in real time with high accuracy. | |
Gas Dosing system | The overall pressure range can be controlled -20kPa to 20kPa (relative pressure) |
Rated Voltage | Single phase 220V 50Hz |
RF Power Supply (PECVD only) | |
Signal Frequency | 13.56MHz±0.005% |
Power Output Range | 500W |
Maximum Reflected Power | 500W |
RF Output Interface | 50Ω,N-type,female |
Power Stability | ±0.1% |
Garmonic Components | ≤-50dbc |
Supply Voltage | Single-phase AC (187V-253V) frequency 50/60HZ |
Overall Machine Efficiency | >=70% |
Power Factor | >=90% |
Cooling Method | Forced air cooling |
Model | Tube Outer Dia*Heating Zone (mm) | Tube Length（mm） | Power(kW) | Max Temp(℃) | Gas Control | Ultimate Vacuum(Pa) |
BR-CVD-60 | Φ60*400 | 1200 | 3 | 1200 | 3 Way | 10Pa/7x10-3 |
BR-CVD-80 | Φ80*400 | 1200 | 4 | 1200 | 3 Way | 10Pa/7x10-3 |
BR-CVD-100 | Φ100*400 | 1200 | 6 | 1200 | 3 Way | 10Pa/7x10-3 |
Model | Tube Outer Dia*Heating Zone (mm) | Power (kW) | Max Temp (℃) | RF Power Supply | Gas Control | Ultimate Vacuum(Pa) | |
Frequency | Power(kW) | ||||||
BR-PECVD-60 | Φ60*450 | 4 | 1200 | 13.56MHz±0.005% | 300-500W | 3 Way | 10Pa/7x10-3 |
BR-PECVD-80 | Φ80*450 | 5 | 1200 | 3 Way | 10Pa/7x10-3 | ||
BR-PECVD-100 | Φ100*450 | 7 | 1200 | 3 Way | 10Pa/7x10-3 | ||
