Chemical Vapor Deposition (CVD) & PECVD Furnace System

  • Max Temp:1200 °C
  • Atmosphere Control:Vacuum, N₂, Ar, H₂, mixed gas and other inert / reducing atmospheres
  • Thermocouple:K-type (1200) / S-type (1400) / B-type (1600)
  • Heating rate:≤ 20 °C / min
  • Certification:CE / ISO 9001 certified
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    Customized Vacuum Solutions

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    High Thermal Efficiency

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    Ultra-Clean Vacuum Environment

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    Stable & Repeatable Results

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    Industry-Grade Safety Design

Advanced CVD & PECVD Furnace Systems

Brother Furnace provides customized chemical vapor deposition systems for research laboratories, universities and industrial applications.

Our CVD furnace solutions support:

✓ Thermal CVD

✓ Plasma Enhanced CVD (PECVD)

✓ Graphene Growth

✓ Carbon Nanotube Synthesis

✓ Thin Film Deposition

✓ Semiconductor Material Research

Carbon-Nanotube-CVD-Furnace
Nanotube-CVD-Furnace
CVD-rotary-tube-furnace

CVD System Categories

Thermal CVD Furnace

High-temperature chemical vapor deposition system using thermal reaction technology.

Applications:

  • Graphene growth

  • CNT synthesis

  • Nanomaterials

  • Thin film coating

PECVD System

Plasma-enhanced CVD system using a 13.56 MHz RF plasma source for high-quality thin film deposition.

Applications:

  • Semiconductor coating

  • Silicon nitride films

  • Carbon films

  • Optical coating

Graphene CVD Furnace

Specially designed for graphene synthesis on copper foil and other catalytic substrates.

Features:

  • High temperature uniformity

  • Gas mixing control

  • Vacuum process

  • Custom substrate holder

Carbon Nanotube CVD Furnace

Designed for CNT growth and carbon nanomaterial research.

Processes:

  • Thermal CVD

  • Plasma CVD

  • Floating catalyst CVD

Multi-Zone CVD Furnace

Temperature gradient control improves deposition quality and process repeatability.

Options:

  • Single zone

  • Double zone

  • Three-zone

Customized CVD System

Brother Furnace provides customized solutions including:

  • Tube diameter

  • Heating length

  • Vacuum system

  • Gas delivery system

  • RF plasma source

Key Advantages of Brother CVD System

Precise Temperature Control

Advanced PID control system provides temperature accuracy up to ±1℃ for stable deposition processes.

Advanced Gas Delivery

Multi-channel mass flow controllers ensure accurate precursor and carrier gas control.

High Uniformity Deposition

Optimized gas distribution and heating structure improve film thickness uniformity.

Flexible Vacuum Configuration

Different vacuum systems are available:

  • Rotary vane pump

  • Diffusion pump

  • Molecular pump

Plasma Enhanced Deposition

PECVD models provide:

  • RF frequency: 13.56MHz

  • RF power: 300-500W

Technical Parameters

(The model and general dimensions need to be determined)

Product Name

CVD Chemical Vapor Deposition System

Model

BR-CVD/PECVD

Slide

With slide, the furnace can be slid to achieve rapid heating or cooling function

Heating Zone Length

400mm single heating zone/dual heating zone

Furnace Tube Size

60x1200mm (outer diameter x length)

Furnace Tube Material

High purity quartz tube

Operating Temperature

≤1100℃

Temperature Control System

Artificial intelligence PID instrument, automatic temperature control

Temperature Control Accuracy

±1℃ (with over-temperature and thermocouple-off alarm functions)

Heating Rate

Recommended 0~10℃/min

Heating Element

High quality resistance wire

Vacuum System

Rated Voltage

Single phase 220V 50Hz

Gas Filling System

Inert gases such as nitrogen and argon

Temperature Measuring

Thermocouple temperature measurement

Shell Structure

Double-layer shell structure with air cooling system

Vacuum Flange

It has an air inlet and a pressure control valve, pneumatic pressure relief valve and air release valve at the other end.

Air Supply System

Four-way precision proton flow meter, adjust gas flow through touch screen

Vacuum System

Rotary vane pump, the vacuum degree can reach 1Pa in the cold state of the empty furnace.

Vacuum gauge: Imported digital display vacuum gauge displays the vacuum degree in real time with high accuracy.

Gas Dosing system

The overall pressure range can be controlled -20kPa to 20kPa (relative pressure)

Rated Voltage

Single phase 220V 50Hz

RF Power Supply (PECVD only)

Signal Frequency

13.56MHz±0.005%

Power Output Range

500W

Maximum Reflected Power

500W

RF Output Interface

50Ω,N-type,female

Power Stability

±0.1%

Garmonic Components

≤-50dbc

Supply Voltage

Single-phase AC (187V-253V) frequency 50/60HZ

Overall Machine Efficiency

>=70%

Power Factor

>=90%

Cooling Method

Forced air cooling

Model

Tube Outer Dia*Heating Zone (mm)

Tube Length(mm)

Power(kW)

Max Temp(℃)

Gas Control

Ultimate Vacuum(Pa)

BR-CVD-60

Φ60*400

1200

3

1200

3 Way

10Pa/7x10-3

BR-CVD-80

Φ80*400

1200

4

1200

3 Way

10Pa/7x10-3

BR-CVD-100

Φ100*400

1200

6

1200

3 Way

10Pa/7x10-3

Model

Tube Outer Dia*Heating Zone (mm)

Power

(kW)

Max Temp

(℃)

RF Power Supply

Gas Control

Ultimate Vacuum(Pa)

Frequency

Power(kW)

BR-PECVD-60

Φ60*450

4

1200

13.56MHz±0.005%

300-500W

3 Way

10Pa/7x10-3

BR-PECVD-80

Φ80*450

5

1200

3 Way

10Pa/7x10-3

BR-PECVD-100

Φ100*450

7

1200

3 Way

10Pa/7x10-3

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